Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate
2005-05-17
2005-05-17
Hassanzadeh, Parviz (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With radio frequency antenna or inductive coil gas...
C118S7230IR, C118S7230AN, C315S111510
Reexamination Certificate
active
06893533
ABSTRACT:
The invention in one embodiment is realized in a plasma reactor for processing a semiconductor workpiece. The reactor includes a vacuum chamber having a side wall and a ceiling, a workpiece support pedestal within the chamber and generally facing the ceiling, a gas inlet capable of supplying a process gas into the chamber and a solenoidal interleaved parallel conductor coil antenna overlying the ceiling and including a first plurality conductors wound about an axis of symmetry generally perpendicular to the ceiling in respective concentric helical solenoids of at least nearly uniform lateral displacements from the axis of symmetry, each helical solenoid being offset from the other helical solenoids in a direction parallel to the axis of symmetry. An RF plasma source power supply is connected across each of the plural conductors.
REFERENCES:
patent: 3573840 (1971-04-01), Gouillou et al.
patent: 4795529 (1989-01-01), Kawasaki et al.
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4844775 (1989-07-01), Keeble
patent: 4849675 (1989-07-01), Muller
patent: 4872947 (1989-10-01), Wang et al.
patent: 4922261 (1990-05-01), O'Farrell
patent: 4948458 (1990-08-01), Ogle
patent: 4992665 (1991-02-01), Mohl
patent: 5122251 (1992-06-01), Campbell et al.
patent: 5194731 (1993-03-01), Turner
patent: 5277751 (1994-01-01), Ogle
patent: 5280154 (1994-01-01), Cuomo et al.
patent: 5326404 (1994-07-01), Sato
patent: 5346578 (1994-09-01), Benzing et al.
patent: 5368710 (1994-11-01), Chen et al.
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5540824 (1996-07-01), Yin et al.
patent: 5653811 (1997-08-01), Chan
patent: 5710486 (1998-01-01), Ye et al.
patent: 5718795 (1998-02-01), Plavidal et al.
patent: 5753044 (1998-05-01), Hanawa et al.
patent: 5874704 (1999-02-01), Gates
patent: 5907221 (1999-05-01), Sato et al.
patent: 5919382 (1999-07-01), Qian et al.
patent: 6016131 (2000-01-01), Sato et al.
patent: 6020686 (2000-02-01), Ye et al.
patent: 6023251 (2000-02-01), Koo et al.
patent: 6024826 (2000-02-01), Collins et al.
patent: 6028285 (2000-02-01), Khater et al.
patent: 6036878 (2000-03-01), Collins
patent: 6095083 (2000-08-01), Rice et al.
patent: 6127275 (2000-10-01), Flamm
patent: 6164241 (2000-12-01), Chen et al.
patent: 6259209 (2001-07-01), Bhardwaj et al.
patent: 6280563 (2001-08-01), Baldwin, Jr. et al.
patent: 6308654 (2001-10-01), Schneider et al.
patent: 6320320 (2001-11-01), Bailey, III et al.
patent: 6409933 (2002-06-01), Holland et al.
patent: 6444084 (2002-09-01), Collins
patent: 6462481 (2002-10-01), Holland et al.
patent: 6507155 (2003-01-01), Barnes et al.
patent: 0 378 828 (1990-07-01), None
patent: 0 413 282 (1991-02-01), None
patent: 0 489 407 (1992-06-01), None
patent: 0 520 519 (1992-12-01), None
patent: 0 596 551 (1994-05-01), None
patent: 0 602 764 (1994-06-01), None
patent: 0 710 055 (1994-10-01), None
patent: 0 727 807 (1996-08-01), None
patent: 0 727 923 (1996-08-01), None
patent: 0 756 309 (1997-01-01), None
patent: 2 231 197 (1990-11-01), None
patent: 10-149-898 (1996-02-01), None
patent: WO 9110341 (1991-07-01), None
patent: WO 9220833 (1992-11-01), None
Barnes Michael
Holland John
Todorow Valentin N.
Bach Joseph
Hassanzadeh Parviz
Wallace Robert M.
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