Plasma source assembly and method of manufacture

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...

Reexamination Certificate

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C118S7230IR

Reexamination Certificate

active

10601590

ABSTRACT:
A plasma source assembly including an outer shield, a dielectric chamber wall, and a helical coil provided between the outer shield and the dielectric chamber wall. The plasma source assembly also includes a coil support assembly configured to facilitate repeatable performance of the helical coil. Preferably, the assembly includes a plenum cooling plate that is configured to supply cooling fluid to a first cooling rod provided within a resonator cavity defined by the chamber wall and the outer shield, and receive cooling fluid from a second cooling rod provided within the resonator cavity. The assembly preferably also includes a spacer provided between the first cooling rod and the second cooling rod, and coil insulators having holes configured to receive the helical coil.

REFERENCES:
patent: 4431901 (1984-02-01), Hull
patent: 5304282 (1994-04-01), Flamm
patent: 5405480 (1995-04-01), Benzing et al.
patent: 5560844 (1996-10-01), Boulos et al.
patent: 5584971 (1996-12-01), Komino
patent: 5680014 (1997-10-01), Miyamoto et al.
patent: 5681418 (1997-10-01), Ishimaru
patent: 6245202 (2001-06-01), Edamura et al.
patent: 97-39607 (1997-10-01), None

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