4. Stock material or miscellaneous articles
  5. Composite
  6. Of silicon containing

Sharon L. Nunes

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Base developable negative photoresist composition and use thereo

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Dielectric structures having embedded gap filling RIE etch stop

Stock material or miscellaneous articles – Composite – Of silicon containing
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Dielectric structures having embedded gap filling RIE etch stop

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Dry developable photoresist and use thereof

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Dry developable photoresist containing an epoxide, organosilicon

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sharon L. Nunes does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Sharon L. Nunes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sharon L. Nunes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-606015

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure