Base developable negative photoresist composition and use thereo

Details Base developable negative photoresist composition and use thereo Base developable negative photoresist composition and use thereo

1991-09-26

1994-02-15

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430283, 430284, 430325, 430323, 430906, 430909, 430914, G03C 172, G03C 173

Patent

active

052865991

ABSTRACT:
A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.

REFERENCES:
patent: 4481279 (1984-11-01), Naito et al.
patent: 4722881 (1988-02-01), Ueno et al.
patent: 4865945 (1989-09-01), Noguchi et al.
patent: 4981909 (1991-01-01), Babich et al.
patent: 5041358 (1991-08-01), Hatzakis et al.
patent: 5059512 (1991-10-01), Babich et al.
patent: 5079131 (1992-01-01), Thackeray et al.
patent: 5098816 (1992-03-01), Babich et al.
patent: 5118582 (1992-06-01), Veno et al.
Chem. Abstract, CA110:240234n-Resists for negative-working patterns (Masayuki).

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