Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-04-29
1993-07-20
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
522 31, 522146, 522134, 522170, G03F 7038
Patent
active
052292517
ABSTRACT:
A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
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Iwayanagi, et al., "Deep-UV Lithography," Electronic and Photonic Applications of Polymers, Advances in Chemistry Series 218, 192nd Meeting of the American Chemical Society, California, Sep. 7-12, 1986, pp. 163-166.
MacDonald, et al., "A New Oxygen Plasma Developable UV Sensitive Resist," Research Report, RJ 4834 (51095) Oct. 7, 1985 Chemistry.
Babich Edward D.
Gelorme Jeffrey D.
Nunes Ronald W.
Nunes Sharon L.
Paraszczak Jurij R.
Hamilton Cynthia
International Business Machines Corp.
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