Dry developable photoresist and use thereof

Details Dry developable photoresist and use thereof Dry developable photoresist and use thereof

1993-07-02

1995-10-10

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430325, 430330, 430921, 430942, G03C 500

Patent

active

054570050

ABSTRACT:
A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.

REFERENCES:
patent: 4241165 (1980-12-01), Hughes et al.
patent: 4297401 (1981-10-01), Chern et al.
patent: 4426431 (1984-01-01), Harasta et al.
patent: 4433044 (1984-02-01), Meyer et al.
patent: 4481279 (1984-11-01), Naito et al.
patent: 4551417 (1985-11-01), Suzuki et al.
patent: 4751170 (1988-06-01), Mimura et al.
patent: 4940651 (1990-07-01), Brown et al.
patent: 5041358 (1991-08-01), Hatzakis et al.
patent: 5059512 (1991-10-01), Babich et al.
Iwayanagi, et al., Deep-UP Lithography, Electronic and Photonic Applications of Polymers, Advances in Chemistry Series 218, 192nd Meeting of the American Chemical Society, California, Sep. 7-12, 1986, pp. 163-166.
MacDonald, et al., A New Oxygen Plasma Developable UV Sensitive Resist, Research Report, RJ 4834 (51095) Oct. 7, 1986 Chemistry.

Affiliated with

Also associated with

Rating

Dry developable photoresist and use thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry developable photoresist and use thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry developable photoresist and use thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2309720