Ronald Hiskes

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Chemical vapor phase method for forming thin films of high tempe

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
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Growth of electroluminescent phosphors by MOCVD

Coating processes – Coating by vapor – gas – or smoke – Organic coating applied by vapor – gas – or smoke
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High speed chemical vapor deposition process utilizing a reactor

Coating processes – Optical element produced – Polarizer – windshield – optical fiber – projection screen – or...
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Liquid phase epitaxial method for forming single crystal films o

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
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MOCVD system for forming superconducting thin films

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
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Profile ID: LFUS-PAI-P-84006

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