Chemical vapor phase method for forming thin films of high tempe

Details Chemical vapor phase method for forming thin films of high tempe Chemical vapor phase method for forming thin films of high tempe

1988-12-02

1993-03-30

Roy, Upendra

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

20419224, 437 62, 505734, H01L 3900, H01B 1200

Patent

active

051984113

ABSTRACT:
A method and apparatus are disclosed for chemically vapor depositing a thin film of an oxide based superconductor on a substrate, which is preferably a substrate comprising superconducting material. Gaseous forms of the respective reactants are first formed and then reacted together in a reaction zone adjacent a spinning substrate. In a preferred embodiment, the reactants are exposed to UV light during the reaction to catalyze the reaction.

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