High speed chemical vapor deposition process utilizing a reactor

Details High speed chemical vapor deposition process utilizing a reactor High speed chemical vapor deposition process utilizing a reactor

1988-10-26

1989-09-05

Bell, Janyce

Coating processes

Optical element produced

Polarizer, windshield, optical fiber, projection screen, or...

65 606, 65 608, 427166, 4272481, 427249, 427255, 4272551, 4272552, 4272555, 427402, 4274072, B05D 506

Patent

active

048637602

ABSTRACT:
A CVD furnace, having a gas seal and a liquid seal, for chemical vapor deposition of a coating on a fiber. A CVD process utilizing the CVD furnace allows fibers to be pulled through the furnace without drawing gases entrained by the moving fiber into the reaction chamber of the furnace. The process is a hot fiber process, preferably deriving its heat from the meltdown point in an optical fiber pulling process. A coat containing carbon is applied by supplying a reactant containing a carbon having a triple bond. A small amount of silane is also supplied to the reaction chamber to act as an oxygen getter and to prevent tar-like reaction products from clogging the furnace.

REFERENCES:
patent: 3341376 (1967-09-01), Spenke et al.
patent: 3924034 (1975-12-01), Olcott
patent: 3944686 (1976-03-01), Froberg
patent: 4183621 (1980-01-01), Kao
patent: 4358473 (1982-11-01), Debolt et al.
patent: 4575463 (1986-03-01), Biswas et al.

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