Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
Inventor
active
Dual damascene metallization
Dual damascene metallization
Integrated CVD/PVD Al planarization using ultra-thin nucleation
Integrated nitrogen-treated titanium layer to prevent interactio
Integration of ALD tantalum nitride for copper metallization
No associations
LandOfFree
Roderick Craig Mosely does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Roderick Craig Mosely, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Roderick Craig Mosely will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-649108