Masahiko Ogirima

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Epitaxial growth device

Coating apparatus – With vacuum or fluid pressure chamber
Patent

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Germanium-containing silicon nitride film

Stock material or miscellaneous articles – Composite – Of bituminous or tarry residue
Patent

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Method of diffusing an impurity

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent

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Method of forming electrode of semiconductor device

Metal working – Method of mechanical manufacture – Electrical device making
Patent

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Method of making an epitaxial growth layer of GaAs.sub.1-x P.sub

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent

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Profile ID: LFUS-PAI-P-343750

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