Method of diffusing an impurity

Details Method of diffusing an impurity Method of diffusing an impurity

1981-01-26

1983-02-15

Ozaki, G.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

148188, 148190, H01L 21223

Patent

active

043739750

ABSTRACT:
Alumina or aluminum is arranged on, or in the vicinity of, a wafer surface into which an impurity, particularly antimony, is to be diffused, and the impurity is vapor-diffused.
The impurity can be diffused in much larger quantities than in a prior art vapor diffusion, and a very low sheet resistance for the diffused layer of antimony can be attained.

REFERENCES:
patent: 2898247 (1959-08-01), Hunter
patent: 3041213 (1962-06-01), Anderson et al.
patent: 3314833 (1967-04-01), Arndt et al.
patent: 3320103 (1967-05-01), Drake et al.
patent: 3362858 (1968-01-01), Knopp
patent: 3530016 (1970-09-01), Joseph
patent: 3532564 (1970-10-01), Gittler
patent: 3841927 (1974-10-01), Florence et al.
patent: 3907618 (1975-09-01), Rapp
patent: 3923563 (1975-12-01), Venkatu
patent: 4040878 (1977-08-01), Rowe
patent: 4214918 (1980-07-01), Gat et al.
patent: 4239560 (1980-12-01), Chang et al.

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