4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Koichiro Inazawa

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Dry developing method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Etching method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Etching method and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Profile ID: LFUS-PAI-P-1436138

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