Semiconductor device fabrication chamber cleaning method and...

Details Semiconductor device fabrication chamber cleaning method and... Semiconductor device fabrication chamber cleaning method and...

2005-03-08

2005-03-08

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S715000, C156S345290, C156S345350, C134S001100, C134S001200

Reexamination Certificate

active

06863019

ABSTRACT:
A method of cleaning a semiconductor fabrication processing chamber involves recirculation of cleaning gas components. Consequently, input cleaning gas is utilized efficiently, and undesirable emissions are reduced. The method includes flowing a cleaning gas to an inlet of a processing chamber, and exposing surfaces of the processing chamber to the cleaning gas to clean the surfaces, thereby producing a reaction product. The method further includes removing an outlet gas including the reaction product from an outlet of the processing chamber, separating at least a portion of the reaction product from the outlet gas, and recirculating a portion of the outlet gas to the inlet of the processing chamber.

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