Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate
2006-04-28
2008-10-07
Ahmed, Shamim (Department: 1792)
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
C216S058000, C216S059000, C438S706000, C438S710000, C156S345340
Reexamination Certificate
active
07431859
ABSTRACT:
A plasma etch process includes injecting process gases with different compositions of chemical species through different radial gas injection zones of an overhead electrode to establish a desired distribution of chemical species among the plural gas injection zones.
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Bera Kallol
Brillhart Paul Lukas
Doan Kenny L.
Geoffrion Bruno
Gold Ezra Robert
Ahmed Shamim
Applied Materials Inc.
Law Office of Robert M. Wallace
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