Pattern evaluation apparatus and a method of pattern evaluation

Details Pattern evaluation apparatus and a method of pattern evaluation Pattern evaluation apparatus and a method of pattern evaluation

1995-09-13

1997-02-11

Gonzalez, Frank

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356390, 356368, 356237, G01B 1100

Patent

active

056026455

ABSTRACT:
The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

REFERENCES:
patent: 2898801 (1959-08-01), Rockafellow
patent: 4165939 (1979-08-01), Woodrow et al.
patent: 4244652 (1981-01-01), Berger et al.
patent: 4377340 (1983-03-01), Green et al.
patent: 5400135 (1995-03-01), Maeda

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