Negative resist process with simultaneous development and...

Details Negative resist process with simultaneous development and... Negative resist process with simultaneous development and...

2005-09-20

2005-09-20

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S311000, C430S313000, C430S330000, C430S270100, C430S331000

Reexamination Certificate

active

06946236

ABSTRACT:
The invention relates to a process for producing amplified negative resist structures in which, following exposure and contrasting of the resist, the resist structure is simultaneously developed and aromatized. This substantially simplifies the production of amplified resist structures. Amplifying agents include compounds having not only a reactive group for attachment to an anchor group of the polymer, but also at least one aromatic group.

REFERENCES:
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patent: 5173393 (1992-12-01), Sezi et al.
patent: 5234793 (1993-08-01), Sebald et al.
patent: 5234794 (1993-08-01), Sebald et al.
patent: 6136499 (2000-10-01), Goodall et al.
patent: 0 395 917 (1990-11-01), None
patent: WO 01/42860 (2001-06-01), None

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