Jörg Rottstegge

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Amplification of resist structures of fluorinated resist...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
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Chemical consolidation of photoresists in the UV range

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
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CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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Fluorine-containing photoresist having reactive anchors for...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
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Negative resist process with simultaneous development and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
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Profile ID: LFUS-PAI-P-2701152

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