Method of reducing residue accumulation in CVD chamber using cer

Details Method of reducing residue accumulation in CVD chamber using cer Method of reducing residue accumulation in CVD chamber using cer

1995-12-22

1999-03-23

Tsang, Cecilia J.

Coating apparatus

Gas or vapor deposition

With treating means

118723ME, 118723MW, 118715, 118719, 118720, 118725, 118728, 156345, 1566251, 1566431, 1566461, C23C 1600, B44C 122

Patent

active

058853561

ABSTRACT:
The present invention provides a method and apparatus for limiting residue build-up by lining with a ceramic material the exhaust plenun and exhaust manifold of a processing chamber. In another aspect of the invention, the inventors have used an air gap between the ceramic liner and the processing chamber walls to increase the dielectric value of the ceramic liner, and further inhibit the build-up of residues. In another aspect, the ceramic liner has been found to retain sufficient heat to allow the elimination of heaters typically used to heat the aluminum walls during a clean operation, if the clean operation is commenced immediately after a process step so that the ceramic retains the necessary heat from the previous processing step. The provision of an air gap aids in this heating, preventing the ceramic heat from being drawn off by direct contact with the aluminum walls. In a preferred embodiment, the ceramic liners are attached to the chamber walls with TEFLON.RTM. (polytetrafluoroethylene) screws.

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