4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Alex Schreiber

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Apparatus for substrate processing with improved throughput and

Coating apparatus – Gas or vapor deposition
Patent

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CVD Processing chamber

Coating apparatus – Gas or vapor deposition
Patent

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CVD processing chamber

Compositions – Fire-extinguishing – Foam-stabilizant or colloid-stabilizant containing
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Faceplate thermal choke in a CVD plasma reactor

Coating apparatus – Gas or vapor deposition
Patent

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Gas distribution plate

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Profile ID: LFUS-PAI-P-328199

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