Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-07-26
2005-07-26
Smith, Matthew (Department: 2825)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S781000
Reexamination Certificate
active
06921727
ABSTRACT:
A method of treating a dielectric layer having a low dielectric constant, where the dielectric layer has been processed in a manner that causes a change in the dielectric constant of an affected region of the layer. The treatment of the affected region may comprise etching, sputtering, annealing, or combinations thereof. The treatment returns the dielectric constant of the dielectric layer to substantially the dielectric constant that existed before processing.
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Chiang Kang-Lie
Conti Giuseppina R.
Dahimene Mahmoud
Delgadino Gerardo A.
Hung Hoiman
Applied Materials Inc.
Bach Joseph
Malsawma Lex H.
Moser Patterson & Sheridan LLP
Smith Matthew
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