4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Joseph Bach

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Active species control with time-modulated plasma

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Adjustable dual frequency voltage dividing plasma reactor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus
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Adjusting DC bias voltage in plasma chamber

Coating apparatus – Gas or vapor deposition – With treating means
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Apparatus and method for detecting a presence or position of...

Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
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Apparatus and method for detecting an end point of chamber...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With measuring – sensing – detection or process control means
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Profile ID: LFUS-PAI-P-2028134

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