4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Gerardo A. Delgadino

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Capacitively coupled plasma reactor with uniform radial...

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate

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Method for modifying dielectric characteristics of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method of forming a low-K dual damascene interconnect structure

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method of forming a low-K dual damascene interconnect structure

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Methods for etching a dielectric barrier layer with high...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Profile ID: LFUS-PAI-P-2345283

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