Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2007-07-17
2007-07-17
Deo, Duy-Vu N. (Department: 1765)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C438S785000
Reexamination Certificate
active
10741422
ABSTRACT:
A method for processing substrates is provided. The method includes depositing and etching a low k dielectric layer on a substrate, pre-cleaning the substrate with a plasma, and depositing a barrier layer on the substrate. Pre-cleaning the substrate minimizes the diffusion of the barrier layer into the low k dielectric layer and/or enhances the deposition of the barrier layer.
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Bekiaris Nikolaos
Chen Ling
Chung Hua
Marcadal Christophe
Applied Materials Inc.
Deo Duy-Vu N.
Patterson & Sheridan LLP
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