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Nikolaos Bekiaris

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Integration of ALD/CVD barriers with porous low k materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate

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Ionic additives for extreme low dielectric constant chemical...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Ionic additives for extreme low dielectric constant chemical...

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Composite having voids in a component
Reexamination Certificate

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Ionic additives for extreme low dielectric constant chemical...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Mesoporous films having reduced dielectric constants

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Composite having voids in a component
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2631277

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