Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1999-07-16
2000-03-28
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430905, 430910, G03F 730
Patent
active
060430036
ABSTRACT:
The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.
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Bucchignano James J.
Huang Wu-Song
Katnani Ahmad D.
Lee Kim Y.
Moreau Wayne M.
Capella, Esq. Steven
Chu John S.
International Business Machines - Corporation
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