Abrading – Work holder – Work rotating
Patent
1997-08-08
2000-11-14
Eley, Timothy V.
Abrading
Work holder
Work rotating
451288, B24B 4702
Patent
active
061462594
ABSTRACT:
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head may include a projection which contacts an upper surface of the flexible membrane to apply an increased load to a potentially underpolished region of a substrate. Fluid jets may be used for the purpose.
REFERENCES:
patent: 4373991 (1983-02-01), Banks
patent: 4918869 (1990-04-01), Kitta
patent: 5081795 (1992-01-01), Tanaka et al.
patent: 5193316 (1993-03-01), Olmstead
patent: 5205082 (1993-04-01), Shendon et al.
patent: 5230184 (1993-07-01), Bukhman
patent: 5423558 (1995-06-01), Koeth et al.
patent: 5423716 (1995-06-01), Strasbaugh
patent: 5441444 (1995-08-01), Nakajima
patent: 5443416 (1995-08-01), Volodarsky et al.
patent: 5476414 (1995-12-01), Hirose et al.
patent: 5498199 (1996-03-01), Karlsrud et al.
patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5624299 (1997-04-01), Shendon
patent: 5635083 (1997-06-01), Breivogel et al.
patent: 5643053 (1997-07-01), Shendon
patent: 5681215 (1997-10-01), Sherwood et al.
patent: 5733182 (1998-03-01), Muramatsu et al.
patent: 5795215 (1998-08-01), Guthrie et al.
patent: 5803799 (1998-08-01), Volodarsky et al.
patent: 5820448 (1998-10-01), Shamouilian et al.
patent: 5851140 (1998-12-01), Barns et al.
Birang Manoocher
Chen Hung Chih
Ko Sen-Hou
Wijekoon Kapila
Zuniga Steven M.
Applied Materials Inc.
Eley Timothy V.
Nguyen Dung Van
LandOfFree
Carrier head with local pressure control for a chemical mechanic does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Carrier head with local pressure control for a chemical mechanic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Carrier head with local pressure control for a chemical mechanic will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2060487