Carrier head with local pressure control for a chemical mechanic

Abrading – Work holder – Work rotating

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Details

451288, B24B 4702

Patent

active

061462594

ABSTRACT:
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head may include a projection which contacts an upper surface of the flexible membrane to apply an increased load to a potentially underpolished region of a substrate. Fluid jets may be used for the purpose.

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