4. Metal treatment
  5. Barrier layer stock material, p-n type
  6. With contiguous layers of different semiconductive material
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III-V Compound heteroepitaxial 3-D semiconductor structures util

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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III-V on Si heterostructure using a thermal strain layer

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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Infra-red light emissive devices

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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Intermetallic compound semiconductor thin film

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
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