4. Metal treatment
  5. Barrier layer stock material, p-n type
  6. With contiguous layers of different semiconductive material
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Economical silicon-on-silicon hybrid wafer assembly

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Reexamination Certificate

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Epitaxial metal-insulator-metal-semiconductor structures

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Patent

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Epitaxial substrate for high-intensity led, and method of manufa

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Patent

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Epitaxial wafer for use in production of light emitting diode

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Patent

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Epitaxial wafer having a gallium nitride epitaxial layer...

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Reexamination Certificate

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Epitaxy for growing compound semiconductors and an InP substrate

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material
Patent

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