Intermetallic compound semiconductor thin film

Metal treatment – Barrier layer stock material – p-n type – With contiguous layers of different semiconductive material

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437133, H01L 2912

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active

054219108

ABSTRACT:
An intermetallic compound semiconductor thin film comprises thin film made of the III-V group intermetallic compound InTlSb. Preferably, the thin film is grown by a vapor phase MOCVD method.

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