Semiconductor device with high conductivity region using...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S561000, C257SE21056

Reexamination Certificate

active

10151595

ABSTRACT:
A method and structure is provided for an integrated circuit with a semiconductor substrate having an opening provided therein. A doped high conductivity region is formed from doped material in the opening and a diffused dopant region proximate the doped material in the opening. A structure is over the doped high conductivity region selected from a group consisting of a wordline, a gate, a dielectric layer, and a combination thereof.

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patent: 2001/0028075 (2001-10-01), Chen et al.

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