Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-04-24
2007-04-24
Whitehead, Jr., Carl (Department: 2813)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S561000, C257SE21056
Reexamination Certificate
active
10151595
ABSTRACT:
A method and structure is provided for an integrated circuit with a semiconductor substrate having an opening provided therein. A doped high conductivity region is formed from doped material in the opening and a diffused dopant region proximate the doped material in the opening. A structure is over the doped high conductivity region selected from a group consisting of a wordline, a gate, a dielectric layer, and a combination thereof.
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Erhardt Jeffrey P.
Lingunis Emmanuil
Sahota Kashmir S.
Wong Nga-Ching
Advanced Micro Devices , Inc.
Dolan Jennifer M
Ishimaru Mikio
Jr. Carl Whitehead
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