Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
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Dielectric spacer removal
Fabrication of a CMOS structure with a high-k dielectric...
Formation of fully silicided metal gate using dual...
Gate effective-workfunction modification for CMOS
Low power circuit structure with metal gate and high-k...
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Profile ID: LFUS-PAI-P-2227833