4. Adhesive bonding and miscellaneous chemical manufacture
  5. Delaminating processes adapted for specified product
  6. Delaminating in preparation for post processing recycling step

Tetsuro Hanawa

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Apparatus for inspecting a phase shift mask

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Method of forming a critical resist pattern

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent

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Method of forming resist pattern and method of manufacturing...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate

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Method of forming resist pattern and organic silane compound for

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent

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Method of forming resist pattern and organic silane compound for

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing
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Profile ID: LFUS-PAI-P-616955

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