Method of forming resist pattern and organic silane compound for

Details Method of forming resist pattern and organic silane compound for Method of forming resist pattern and organic silane compound for

1991-12-30

1995-01-10

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

549214, 528 25, 528 29, 528129, 528211, C07F 710

Patent

active

053808894

ABSTRACT:
An organic silane compound for forming an antireflection film on the surface of a substrate prior to forming a resist pattern includes a silicon atom, a leaving group bound to the silicon atom and capable of reacting with a hydroxyl group existing in the surface of the semiconductor substrate to form a covalent bond between the semiconductor substrate and the organic silane compound, and a substituent group capable of absorbing far-ultra violet light. The substrate is coated with the organic silane compound. Resist is applied onto the substrate coated with the organic silane compound. The resist is exposed selectively using far-ultra violet light. The resist is exposed.

REFERENCES:
patent: 4623739 (1986-11-01), Watanabe et al.
patent: 4981986 (1991-01-01), Yoshioka et al.
patent: 5118724 (1992-06-01), Frances et al.
patent: 5162559 (1992-11-01), Wilharm et al.

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