Apparatus for inspecting a phase shift mask

Details Apparatus for inspecting a phase shift mask Apparatus for inspecting a phase shift mask

1991-11-01

1993-12-14

Rosenberg, Richard A.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356398, G01B 1100

Patent

active

052707962

ABSTRACT:
An apparatus for inspecting a phase shift mask includes a light source for irradiating a pattern of a phase shift mask including a light shield member and a phase member, a phase difference detector for generating from light transmitted through the phase shift mask a phase signal including the phase difference created by the phase member, a reference signal generator for generating a reference signal, and a calculation section for detecting a defect in the phase member of the phase shift mask by comparing the phase signal with the reference signal. The reference signal may be generated from a reference mask having the same pattern as that of the phase shift pattern or from CAD data for the formation of the pattern of the phase shift mask.

REFERENCES:
patent: 4559603 (1985-12-01), Yoshikawa
patent: 4623256 (1986-11-01), Ikenaga et al.
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4679938 (1987-07-01), Flamholz
Electronic News, "phase-shift Masks", The Technology that is changing the lithography landscape, Peter Dunn, May 1991, pp. 28-29.

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