4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. To form ohmic contact to semiconductive material

Takeshi Nogami

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Advanced low dielectric constant organosilicon plasma...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Advanced low dielectric constant organosilicon plasma...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Air gap structure having protective metal silicide pads on a...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Apparatus for forming a copper interconnect

Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent

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Cobalt silicidation using tungsten nitride capping layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Patent

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Profile ID: LFUS-PAI-P-207120

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