4. Chemistry of inorganic compounds
  5. Oxygen or compound thereof
  6. Peroxide

Seishi Murakami

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Apparatus for removing tramp materials and method therefor

Refrigeration – Low pressure cold trap process and apparatus
Patent

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Barrier metal layer

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent

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CVD film formation method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Utility Patent

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Film forming and dry cleaning apparatus and method

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Patent

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Heat treating apparatus

Metallurgical apparatus – Means treating solid metal – Having evacuated chamber
Patent

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Profile ID: LFUS-PAI-P-114734

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