4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Robert W. Conn

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Apparatus for coating substrates

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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High density plasma deposition and etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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High density plasma deposition and etching apparatus

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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High density plasma deposition and etching apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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High density plasma deposition and etching apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-24434

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