4. Electric resistance heating devices
  5. Heating devices
  6. Radiant heater

Paul Deaton

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Co-rotating edge ring extension for use in a semiconductor proce

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Method and apparatus for achieving temperature uniformity of a s

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With a step of measuring – testing – or sensing
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Method and apparatus for purging the back side of a substrate du

Drying and gas or vapor contact with solids – Apparatus – With apparatus using centrifugal force
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Multi-ledge substrate support for a thermal processing chamber

Coating apparatus – Gas or vapor deposition – With treating means
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Reflector cover for a semiconductor processing chamber

Electric resistance heating devices – Heating devices – Radiant heater
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Profile ID: LFUS-PAI-P-590894

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