Method and apparatus for purging the back side of a substrate du

Details Method and apparatus for purging the back side of a substrate du Method and apparatus for purging the back side of a substrate du

1997-05-16

1999-10-05

Capossela, Ronald

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

118 72, F26B 1118

Patent

active

059605553

ABSTRACT:
An apparatus for purging the backside of a substrate in a process chamber includes a purge gas injector. The injector includes a substantially annular-shaped opening providing a slit that is structured and arranged to direct a flow of purge gas about radially outward therefrom in a direction approximately parallel to a plane defined by the substrate, wherein the substrate is supported in the process chamber above the purge gas injector. When the substrate is rotated at a sufficient speed, the purge gas flowing from the injector is impelled to flow spirally outward along the backside of the substrate.

REFERENCES:
patent: 4651440 (1987-03-01), Karl
patent: 4677758 (1987-07-01), Aigo
patent: 4790262 (1988-12-01), Nakayama et al.
patent: 4989345 (1991-02-01), Gill, Jr.
patent: 4990374 (1991-02-01), Keeley et al.
patent: 5133284 (1992-07-01), Thomas et al.
patent: 5230741 (1993-07-01), van de Ven et al.
patent: 5238499 (1993-08-01), van de Ven et al.

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