Co-rotating edge ring extension for use in a semiconductor proce

Details Co-rotating edge ring extension for use in a semiconductor proce Co-rotating edge ring extension for use in a semiconductor proce

1997-05-16

2000-10-17

Bueker, Richard

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

118730, 156345, 216 58, H01L 21302

Patent

active

06133152&

ABSTRACT:
An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.

REFERENCES:
patent: 5820686 (1998-10-01), Moore
patent: 5851299 (1998-12-01), Cheng et al.
patent: 5884412 (1999-03-01), Tietz et al.

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