Reflector cover for a semiconductor processing chamber

Electric resistance heating devices – Heating devices – Radiant heater

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Details

392422, 219390, 219405, 118725, 118 501, 25049222, H01L 2126, H01L 21324, F27B 508, F27B 514

Patent

active

060351004

ABSTRACT:
In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.

REFERENCES:
patent: 4550245 (1985-10-01), Arai et al.
patent: 5062386 (1991-11-01), Christensen
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5264038 (1993-11-01), Hara et al.
patent: 5399523 (1995-03-01), Kakoschke
patent: 5660472 (1997-08-01), Peuse et al.

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