4. Computer-aided design and analysis of circuits and semiconductor
  5. Nanotechnology related integrated circuit design

Marina M. Medvedeva

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Gradient method of mask edge correction

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
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Mask correction for photolithographic processes

Image analysis – Applications – Manufacturing or product inspection
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Method and apparatus for optimizing fragmentation of...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method and apparatus for optimizing fragmentation of...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method and apparatus for optimizing fragmentation of...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2417099

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