Method and apparatus for optimizing fragmentation of...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

06988260

ABSTRACT:
The present invention is directed to a method and apparatus for optimizing fragmentation of integrated circuit boundaries for optical proximity correction (OPC) purposes. The present invention may balance the number of vertices and the “flexibility” of the boundary and may recover fragmentation according to the process intensity profile along the ideal edge position to obtain the best decision for OPC.

REFERENCES:
patent: 6249904 (2001-06-01), Cobb
patent: 6269472 (2001-07-01), Garza et al.
patent: 6611953 (2003-08-01), Filseth et al.
patent: 6687895 (2004-02-01), Zhang

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