Gradient method of mask edge correction

Details Gradient method of mask edge correction Gradient method of mask edge correction

2006-05-02

2006-05-02

Smith, Matthew (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07039896

ABSTRACT:
The present invention is directed to a method and apparatus for making mask edge corrections using a gradient method for high density chip designs. The present invention uses a newly defined cost function.

REFERENCES:
patent: 6269472 (2001-07-01), Garza et al.
patent: 6611953 (2003-08-01), Filseth et al.
patent: 6813757 (2004-11-01), Aton et al.
patent: 6928634 (2005-08-01), Granik et al.
patent: 2004/0015808 (2004-01-01), Pang et al.
patent: 2005/0015233 (2005-01-01), Gordon

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