4. Material or article handling
  5. With weighing

Makoto Nagashima

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Back-biased face target sputtering

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Boron phosphorus silicate glass composite layer on semiconductor

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Chemical vapor deposition method and apparatus therefore

Coating processes – Coating by vapor – gas – or smoke
Patent

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Cleaning method for semiconductor wafer processing apparatus

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Patent

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Cleaning method for semiconductor wafer processing apparatus

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Patent

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Profile ID: LFUS-PAI-P-544317

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