Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Ion implantation of dopant into semiconductor region
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Different embedded strain layers in PMOS and NMOS...
Drive current adjustment for transistors formed in the same...
Drive current increase in transistors by asymmetric...
Embedded strain layer in thin SOI transistors and a method...
Embedded strain layer in thin SOI transistors and a method...
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Profile ID: LFUS-PAI-P-2234866