4. Semiconductor device manufacturing: process
  5. Utilizing varying dielectric thickness

Hyeon-Seag Kim

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Angled nitrogen ion implantation for minimizing mechanical...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Reexamination Certificate

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Determination of device failure characteristic

Data processing: measuring – calibrating – or testing – Testing system – Of circuit
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Epitaxial silicon growth and usage of epitaxial gate...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Fabrication of gate of P-channel field effect transistor...

Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Self-aligned
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Fabrication of oxide regions having multiple thicknesses using m

Semiconductor device manufacturing: process – Utilizing varying dielectric thickness
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Profile ID: LFUS-PAI-P-697129

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