4. Radiation imagery chemistry: process, composition, or product th
  5. Including control feature responsive to a test or measurement

Chuen-Huei Yang

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Method for correcting photomask pattern

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Method of inspecting photomask defect

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate

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Phase shift mask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Photomask pattern

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Process utilizing relationship between reflectivity and resist t

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
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Profile ID: LFUS-PAI-P-1425472

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