Method of inspecting photomask defect

Details Method of inspecting photomask defect Method of inspecting photomask defect

2007-11-02

2010-02-16

Cosimano, Edward R (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Quality evaluation

C356S237100, C356S237200, C356S237300, C356S237400, C356S237500, C382S100000, C382S141000, C382S144000, C382S145000, C382S147000, C382S148000, C382S149000, C438S014000, C438S016000, C702S001000, C702S081000, C702S127000, C702S187000, C702S189000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07664614

ABSTRACT:
A method of inspecting defect of a mask is provided. In this method, a database for storing a plurality of virtual simulation models is created. The virtual simulation models are determined by a plurality of factors including an optical effect and a chemical effect during the transferring the pattern of a mask to the photoresist layer on a wafer. A mask defect image is acquired. A simulation contour of the mask defect image is generated from at least one virtual simulation model in the database. Next, the acceptability of the mask is determined.

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